Atomic Layer Deposition Precursors
Atomic Layer Deposition (ALD) is a process used in the manufacture of semiconductors and in some emerging energy conversion technologies. The synthesis and manufacture of many Atomic Layer Deposition (ALD) precursors involve high energy, pyrophoric and generally very sensitive metal based or silane chemistry, often in the presence of highly flammable ether based solvents. This set of chemistries, capabilities and engineering skillset is a core competency within Optima.
Optima’s full range of manufacturing scales is ideally suited to the manufacture of 100’s kg to 100 tons of precursor materials with rapid transfer and implementation of existing technology.
200 Willacoochee Highway
Douglas, GA 31535
Main: (912) 384-5101
Fax: (912) 384-6330
901 West DuPont Ave.
Belle, WV 25015-1555
For Additional Technical Information:
Doug Cochran -VP of Business Development
Mike Harrison-Business Development
Katie Herrington -Operational Excellence Manager